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1997 2nd International Symposium on Plasma Process-Induced Damage : 13-14 May 1997, Monterey, California, USA / Kim P. Cheung, Moritaka Nakamura, and Calvin T. Gabriel, editors ; technical co-sponsors, IEEE/Electron Devices Society, American Vacuum Society, Japanese Society of Applied Physics

データ種別	図書
出版者	Sunnyvale, Calif. : Northern California Chapter of the American Vacuum Society
出版年	c1997
形態	i, 259 p. : ill. ; 28 cm
別書名	表紙タイトル:P2ID 異なりアクセスタイトル:2nd International Symposium on Plasma Process-Induced Damage
著者標目	*International Symposium on Plasma Process-Induced Damage (2nd : 1997 : Monterey, Calif.) Cheung, Kin P. Nakamura, Moritaka Gabriel, Calvin T. IEEE Electron Devices Society American Vacuum Society 応用物理学会
件　名	LCSH:Semiconductor wafers -- Defects -- Congresses  全ての件名で検索 LCSH:Semiconductors -- Effect of radiation on -- Congresses  全ての件名で検索 LCSH:Plasma etching -- Congresses  全ての件名で検索
分　類	NDC:549.8
書誌ID	LT00563731

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